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Photomask Fabrication Technology by Banqiu Wu and Benjamin G. Eynon (2005, Hardcover)

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About this product

Product Identifiers

PublisherMcgraw-Hill Education

ISBN-100071445633

ISBN-139780071445634

eBay Product ID (ePID)45030553

Product Key Features

Book TitlePhotomask Fabrication Technology

Number of Pages500 Pages

LanguageEnglish

Publication Year2005

TopicElectronics / Circuits / Integrated, Telecommunications, Electronics / General

IllustratorYes

GenreTechnology & Engineering

AuthorBanqiu Wu, Benjamin G. Eynon

FormatHardcover

Dimensions

Item Height1.8 in

Item Weight32.4 Oz

Item Length9.1 in

Item Width6 in

Additional Product Features

Intended AudienceTrade

LCCN2005-047886

Dewey Edition22

Dewey Decimal621.3815/31

Table Of ContentIntroduction Data Preparation and Design Pattern Generation Pattern Transfer Photomask Metrology Defect Control and Finishing Inspection, Repair, and Cleaning Resolution Enhancement Techniques Water Fabrication Issues Future Developments Appendices References

SynopsisPublisher's Note: Products purchased from Third Party sellers are not guaranteed by the publisher for quality, authenticity, or access to any online entitlements included with the product. Photomasks are defect-free optical templates -- the printing masters for the fabrication of integrated circuits (ICs). When IC feature sizes fall below the exposure tool's source wavelength, photomask fabrication becomes difficult: very strict mask critical dimension (CD) and feature placement specifications, intensive capital equipment investment, unique raw materials and applications, and special expertise requirements for photomask fabrication technologists are necessary to fabricate modern microelectronics. Thus the rapid recent growth of the field and the need for this book. This text details the science and technology of industrial photomask production, including fundamental principles, industrial production flows, technological evolution and development, and state of the art technologies. Focusing on industrial applications rather than pure science, the goal of the book is to provide a comprehensive reference for any engineer developing microelectronic manufacturing processes

LC Classification NumberTK7872.M3