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Thin Film Processes by John L. Vossen (1979, Hardcover)
US $11.79
ApproximatelyRM 49.94
Condition:
“CONDITION: VERY GOOD +. Previous owner's name on inside flyleaf. Clean inside, no writing or ”... Read moreabout condition
Very Good
A book that has been read but is in excellent condition. No obvious damage to the cover, with the dust jacket included for hard covers. No missing or damaged pages, no creases or tears, and no underlining/highlighting of text or writing in the margins. May be very minimal identifying marks on the inside cover. Very minimal wear and tear.
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Shipping:
US $5.95 (approx RM 25.21) USPS Media MailTM.
Located in: Saint Paul, Minnesota, United States
Delivery:
Estimated between Tue, 12 Aug and Mon, 18 Aug
Returns:
No returns accepted.
Coverage:
Read item description or contact seller for details. See all detailsSee all details on coverage
(Not eligible for eBay purchase protection programmes)
Seller assumes all responsibility for this listing.
eBay item number:335035083610
Item specifics
- Condition
- Very Good
- Seller Notes
- ISBN
- 9780127282503
About this product
Product Identifiers
Publisher
Elsevier Science & Technology Books
ISBN-10
0127282505
ISBN-13
9780127282503
eBay Product ID (ePID)
38744
Product Key Features
Number of Pages
Xi, 564 Pages
Language
English
Publication Name
Thin Film Processes
Publication Year
1979
Subject
Materials Science / General, Materials Science / Thin Films, Surfaces & Interfaces, Mechanical
Type
Textbook
Subject Area
Technology & Engineering
Format
Hardcover
Dimensions
Item Length
9.2 in
Item Width
5.9 in
Additional Product Features
Intended Audience
Scholarly & Professional
LCCN
78-003348
Dewey Edition
20
Illustrated
Yes
Dewey Decimal
621.381/52
Table Of Content
Introduction. J.L. Vossen, Physical Methods of Film Deposition. J.L. Vossen and J.J. Cuomo, Glow Discharge Sputter Deposition. J.A. Thornton and A.S. Penfold, Cylindrical Magnetron Sputtering. D.B. Fraser, The Sputter and S-Gun Magnetrons. R.K. Waits, Planar Magnetron Sputtering. J.M.E. Harper, Ion Beam Deposition. Chemical Methods of Film Deposition. F.A. Lowenheim, Deposition of Inorganic Films from Solution. W. Kern and V.S. Ban, Chemical Vapor Deposition of Inorganic Thin Films. Physical-Chemical Methods of Film Deposition J.R. Hollahan and R.S. Rosler, Plasma Deposition of Inorganic Thin Films. H. Yasuda, Glow Discharge Polymerization. Etching Processes. W. Kern and C.A. Deckert, Chemical Etching. C.M. Melliar-Smith and C.J. Mogab, Plasma-Assisted Etching Techniques for Pattern Delineation. References. Index.
Synopsis
Remarkable advances have been made in recent years in the science and technology of thin film processes for deposition and etching. It is the purpose of this book to bring together tutorial reviews of selected filmdeposition and etching processes from a process viewpoint. Emphasis is placed on the practical use of the processes to provide working guidelines for their implementation, a guide to the literature, and an overview of each process.
Item description from the seller
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