Engineering Thin Films and Nanostructures with Ion Beams by Emile Knystautas

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Item specifics

Condition
Good: A book that has been read but is in good condition. Very minimal damage to the cover including ...
Pages
590
Publication Date
2005-03-01
Book Title
Engineering Thin Films and Nanostructures with Ion Beams
ISBN
9780824724474
Category

About this product

Product Identifiers

Publisher
CRC Press LLC
ISBN-10
082472447X
ISBN-13
9780824724474
eBay Product ID (ePID)
2309777238

Product Key Features

Number of Pages
592 Pages
Language
English
Publication Name
Engineering Thin Films and Nanostructures with Ion Beams
Publication Year
2005
Subject
Nanoscience, Materials Science / Thin Films, Surfaces & Interfaces, Nanotechnology & Mems, Physics / Nuclear
Type
Textbook
Author
Emile Knystautas
Subject Area
Technology & Engineering, Science
Format
Hardcover

Dimensions

Item Height
1.3 in
Item Weight
32.9 Oz
Item Length
9.3 in
Item Width
6.3 in

Additional Product Features

Intended Audience
College Audience
LCCN
2004-058212
Dewey Edition
22
Illustrated
Yes
Dewey Decimal
621.38152
Table Of Content
Introduction, Single Ion Induced Spike Effects on Thin Metal Films: Observation and Simulation, on Beam Effects in Magnetic Thin Films, Selected Topics in Ion Beam Surface Engineering, Optical Effects of Ion Implantation, Metal Alloy Nanoclusters by Ion Implantation in Silica, Intrinsic Residual Stress Evolution in Thin Films During Energetic Particle Bombardment, Industrial Aspects of Ion Implantation Equipment and Ion Beam Generation, Nanostructured Transition-Metal Layers, Nuclear Tracks and Nanostructures, Forensic Applications of Ion-Beam Mixing and Surface Spectroscopy of Latent Fingerprints, Glossary
Synopsis
While ion-beam techniques have been used to create thin films in the semiconductor industry for several decades, these methods have been too costly for other surface treatment applications. However, as manufacturing devices become increasingly smaller, the use of a directed-energy ion beam is finding novel industrial applications that require the custom tailoring of new materials and devices, including magnetic storage devices, photonics, opto-electronics, and molecular transport. Engineering Thin Films and Nanostructures with Ion Beams offers a thorough narrative of the recent advances that make this technology relevant to current and future applications. Featuring internationally recognized researchers, the book compiles their expertise in a multidimensional source that: Highlights the mechanisms and visual evidence of the effects of single-ion impacts on metallic surfaces Considers how ion-beam techniques can help achieve higher disk-drive densities Introduces gas-cluster ion-beam technology and reviews its precedents Explains how ion beams are used to aggregate metals and semiconductors into nanoclusters with nonlinear optical properties Addresses current challenges in building equipment needed to produce nanostructures in an industrial setting Examines the combination of ion-beam techniques, particularly with physical vapor deposition Delineates the fabrication of nanopillars, nanoflowers, and interconnected nanochannels in three dimensions by using atomic shadowing techniques Illustrates the production of nanopores of varying dimensions in polymer films, alloys, and superconductors using ion-beam irradiation Shows how fingerprints can be made more reliable as forensic evidence by recoil-mixing them into the substrate using ion beams From the basics of the ion-beam modification of materials to state-of-the-art applications, Engineering Th, The use of a directed-energy ion beam is finding novel industrial applications that require the custom tailoring of new materials and devices, including magnetic storage devices, photonics, opto-electronics, and molecular transport. From the basics of the ion-beam modification of materials to state-of-the-art applications, Engineering Thin Films and Nanostructures with Ion Beams provides a complete retrospective of the technology and illustrates the wider landscape for which ion beam techniques are becoming increasingly applicable. It includes a CD-ROM with video clips from an electron microscope that details crater formation and annealing by ion beams.
LC Classification Number
TA418.9.T45E52 2004

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